Ceramic Sputtering Targets
Release Date£º[2011-5-24 18:21:47]    Total access[40327]Times
Leadmat manufactures inorganic chemicals and sputtering target to meet the individual specifications and requested compositions. With total quality control and a flexible manufacturing environment, materials produced meet custom applications and support evolving advancements within the industry. Now our available brief manufacture method include melting, HIP,CIP,HP,Press-Sinter... Leadmat will base on material performance select the best way to manufacture and sure our products be best.
Oxide Ceramic Sputtering Targets
Aluminum  Oxide (Al2O3)
Niobium Pentoxide(Nb2O5)
Antimony  Oxide (Sb2O3)
Magnesium Oxide(MgO)
Antimony:Tin Dioxide (Sb:SnO2)(ATO)
Neodymium Oxide (Nd2O3)
Barium Titanate (BaTiO3)
Nickel Oxide(NiO)
Bismuth Oxide (Bi2O3)
Niobium Pentoxide(Nb2O5)
Cerium oxide (CeO2)
Praseodymium Oxide (Pr6O11)
Cerium fluoride (CeF3)
Samarium Oxide(Sm2O3)
Chromium Oxide (Cr2O3)
Scandium Oxide (Sc2O3)
Copper Oxide (CuO)
Silicon Monoxide(SiO)
Dysprosium Oxide (Dy2O3)
Silicon Dioxide(SiO2)
Erbium Oxide(Er2O3)
Strontium Titanate (SrTiO3)
Europium Oxide (Eu2O3)
Tantalum Pentoxide (Ta2O5)
Gadolinium Oxide (Gd2O3)
Terbium Oxide (Tb4O7)
Hafnium Oxide  (HfO2 )
Thulium Oxide (Tm2O3)
Holmium Oxide (Ho2O3)
Titanium Oxide (Ti2O3)
Indium Tin Oxide(ITO)
Titanium Oxide (Ti3O5)
Indium Zinc Oxide (IZO)
Titanium Monoxide (TiO)
Indium Oxide(In2O3)
Titanium Dioxide (TiO2)
Iron Oxide(Fe2O3)
Tungsten Oxide (WO3)
Iron Oxide (Fe3O4)
Tungsten Oxide (WO2.9)
Lanthanum Aluminate(LaAl2O3)
Vanadium Pentoxide (V2O5)
Lead  Zirconate (PbZrO3)
Yttrium oxide(Y2O3)
Lead Oxide (PbO)
Ytterbium Oxide (Yb2O3)
Lead Titanate(PbTiO3)
Zinc oxide (ZnO)
Lead Zirconate(PbZrO3)
AZO (Zinc Aluminum Oxide)
Lead zirconate+Lead Titanate (PbZrO3-PbTiO3) (PZT)
Ga2O3 doped ZnO (GZO)
Lutetium Oxide (Lu2O3)
IZO (Indium Zinc Oxide, 90 wt% In2O3 / 10 wt% ZnO)
Magnesium Oxide(MgO)
Zirconium oxide (ZrO2)
Molybdenum Oxide (MoO)
ZrO2 doped with Ti
Molybdenum Oxide MO3 
ZrO2-Y2O3 stabilized (YSZ)
Neodymium Oxide (Nd2O3)
Nickel Oxide(NiO)
Nitride Ceramic Sputtering Target
Aluminum Nitride (AlN)
Tantalum Nitride (TaN)
Boron Nitride(BN)
Titanium Carbonitride (TiCN)
Gadolinium Nitride (GaN)
Titanium Nitride(TiN)
Hafnium Nitride(HfN)
Vanadium Nitride (VN)
Niobium Niride (NbN)
Zirconium Nitride (ZrN)
Silicom Nitride (Si3N4)
Carbide Ceramic Sputtering Target
Boron Carbide(B4C)
Titanium Carbonitride (TiCN)
Chromium Carbide (Cr3C2)
Tungsten Carbide (W2C)
Hafnium Carbide(HfC)
Tungsten Carbide (WC)
Molybdenum Carbide (Mo2C)
Tungsten CarbideDoped with Nickel (WC+Ni)
Niobium Nitride (NbC)
Tungsten Carbide Doped with Nickel (WC+Ni)
Silicom Carbide (SiC)
Tungsten Carbide Doped with Cobalt (WC+Co)
Tantalum Carbide (TaC)
Vanadium Carbide (VC)
Titanium Carbide(TiC)
Zirconium Carbide(ZrC)
Fluoride Ceramic Sputtering Target
Aluminum Fluiride (AlF3)
Potassdium Fluoride (KF)
Barium Fluoride (BaF2)
Praseodymium Fluoride (PrF3)
Cadmium Fuoride (CdF2)
Lead Fluoride (PbF2)
Calcium Fluoride(CaF2)
Sodium Fluride (NaF)
Cerium fluoride (CeF3)
Strontium Fluoride (SrF3)
Dysprosium Fluoride (DyF3)
Samarium Fluoride (SmF3)
Erbium Fluoride (ErF3)
Hafnium Fluoride (HfF4)
Cryolite Na3AlF6
Lanthanum  fluoride(LaF3)
Lithium Fluoride (LiF)
Ytterbium  Fluoride (YbF3)
Magnesium fluoride  (MgF2)
Yttrium Fluride (YF3)
Neodymium fluoride(NdF3)
Silicide Ceramic Sputtering Target
Chromium Silicide (CrSi2)
Tantalum Silicide (Ta5Si3)
Chromium Silicide (Cr2Si)
Tantalum Silicide (TaSi2)
Cobalt Silicide (Co3Si)
Titanium silicide(Ti5Si3)
HafniumSilicide (HfSi2)
Titanium silicide(TiSi2)
Molybdenum silicide(Mo5Si3)
Tungsten Silicide (WSi2)
Molybdenum Silicide(MoSi2)
Tungsten Sulfide (WS2)
Nickel Silicide (NiSi)
vanadium silicide (V3Si)
Niobium Silicide (Nb5Si3)
Vanadium Silicide (VSi2)
Niobium Silicide(NbSi2)
Zirconium Silicide (ZrSi2)


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